English

The Overlapping Muffin-Tin Approximation

Materials Science 2014-03-05 v2

Abstract

We present the formalism and demonstrate the use of the overlapping muffin-tin approximation (OMTA). This fits a full potential to a superposition of spherically symmetric short-ranged potential wells plus a constant. For one-electron potentials of this form, the standard multiple-scattering methods can solve Schr\"{o}dingers' equation correctly to 1st order in the potential overlap. Choosing an augmented-plane-wave method as the source of the full potential, we illustrate the procedure for diamond-structured Si. First, we compare the potential in the Si-centered OMTA with the full potential, and then compare the corresponding OMTA NN-th order muffin-tin orbital and full-potential LAPW band structures. We find that the two latter agree qualitatively for a wide range of overlaps and that the valence bands have an rms deviation of 20 meV/electron for 30% radial overlap. Smaller overlaps give worse potentials and larger overlaps give larger 2nd-order errors of the multiple-scattering method. To further remove the mean error of the bands for small overlaps is simple.

Keywords

Cite

@article{arxiv.0808.0105,
  title  = {The Overlapping Muffin-Tin Approximation},
  author = {M. Zwierzycki and O. K. Andersen},
  journal= {arXiv preprint arXiv:0808.0105},
  year   = {2014}
}

Comments

9 pages, 3 figures Proceedings of The European Conference "Physics of Magnetism 2008", Poznan, Poland

R2 v1 2026-06-21T11:06:43.844Z