Soft x-ray irradiation induced metallization of layered TiNCl

Noriyuki Kataoka; Masashi Tanaka; Wataru Hosoda; Takumi Taniguchi; Shin-ichi Fujimori; Takanori Wakita; Yuji Muraoka; Takayoshi Yokoya

doi:10.1088/1361-648X/abbbc3

Soft x-ray irradiation induced metallization of layered TiNCl

Materials Science 2020-10-06 v1 Strongly Correlated Electrons

Authors: Noriyuki Kataoka , Masashi Tanaka , Wataru Hosoda , Takumi Taniguchi , Shin-ichi Fujimori , Takanori Wakita , Yuji Muraoka , Takayoshi Yokoya

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Abstract

We have performed soft x-ray spectroscopy in order to study the photoirradiation time dependence of the valence band structure and chemical states of layered transition metal nitride chloride TiNCl. Under the soft x-ray irradiation, the intensities of the states near the Fermi level (EF) and the Ti3+ component increased, while the Cl 2p intensity decreased. Ti 2p-3d resonance photoemission spectroscopy confirmed a distinctive Fermi edge with Ti 3d character. These results indicate the photo-induced metallization originates from deintercalation due to Cl desorption, and thus provide a new carrier doping method that controls the conducting properties of TiNCl.

Keywords

soft x-ray irradiation metallization TiNCl resonant photoemission fermi edge carrier doping

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@article{arxiv.2010.01846,
  title  = {Soft x-ray irradiation induced metallization of layered TiNCl},
  author = {Noriyuki Kataoka and Masashi Tanaka and Wataru Hosoda and Takumi Taniguchi and Shin-ichi Fujimori and Takanori Wakita and Yuji Muraoka and Takayoshi Yokoya},
  journal= {arXiv preprint arXiv:2010.01846},
  year   = {2020}
}

Soft x-ray irradiation induced metallization of layered TiNCl

Abstract

Keywords

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