Sharp-Interface Limit of a Fluctuating Phase-Field Model
Abstract
We present a derivation of the sharp-interface limit of a generic fluctuating phase-field model for solidification. As a main result, we obtain a sharp-interface projection which presents noise terms in both the diffusion equation and in the moving boundary conditions. The presented procedure does not rely on the fluctuation-dissipation theorem, and can therefore be applied to account for both internal and external fluctuations in either variational or non-variational phase-field formulations. In particular, it can be used to introduce thermodynamical fluctuations in non-variational formulations of the phase-field model, which permit to reach better computational efficiency and provide more flexibility for describing some features of specific physical situations. This opens the possibility of performing quantitative phase-field simulations in crystal growth while accounting for the proper fluctuations of the system.
Cite
@article{arxiv.cond-mat/0409707,
title = {Sharp-Interface Limit of a Fluctuating Phase-Field Model},
author = {R. Benítez and L. Ramírez-Piscina},
journal= {arXiv preprint arXiv:cond-mat/0409707},
year = {2016}
}
Comments
21 pages, 1 figure, submitted to Phys. Rev. E