Selective surface functionalization at regions of high local curvature in graphene

Q. Wu; Y. Wu; Y. Hao; J. Geng; M. Charlton; S. Chen; Y. Ren; H. Ji; H. Li; D. W. Boukhvalov; R. D. Piner; C. W. Bielawski; R. S. Ruoff

Selective surface functionalization at regions of high local curvature in graphene

Materials Science 2012-11-28 v1 Mesoscale and Nanoscale Physics Chemical Physics

Authors: Q. Wu , Y. Wu , Y. Hao , J. Geng , M. Charlton , S. Chen , Y. Ren , H. Ji , H. Li , D. W. Boukhvalov , R. D. Piner , C. W. Bielawski , R. S. Ruoff

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Abstract

Monolayer graphene was deposited on a Si wafer substrate decorated with SiO2 nanoparticles (NPs) and then exposed to aryl radicals that were generated in situ from their diazonium precursors. Using micro-Raman mapping, the aryl radicals were found to selectively react with the regions of graphene that covered the NPs. The enhanced chemical reactivity was attributed to the increased strain energy induced by the local mechanical deformation of the graphene.

Keywords

graphene selective surface functionalization high local curvature aryl radicals diazonium precursors micro-Raman mapping strain energy

Cite

@article{arxiv.1211.6202,
  title  = {Selective surface functionalization at regions of high local curvature in graphene},
  author = {Q. Wu and Y. Wu and Y. Hao and J. Geng and M. Charlton and S. Chen and Y. Ren and H. Ji and H. Li and D. W. Boukhvalov and R. D. Piner and C. W. Bielawski and R. S. Ruoff},
  journal= {arXiv preprint arXiv:1211.6202},
  year   = {2012}
}

Comments

7 pages (including supplementary information), 5+3 figures. Accepted to Chemical Communications

Selective surface functionalization at regions of high local curvature in graphene

Abstract

Keywords

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