Second-Order Optical Nonlinearity of AlScN Films Grown By Molecular Beam Epitaxy
Abstract
Alloys of AlN have rapidly emerged as a material platform for nonlinear optics. In this paper, we measure the second-order optical nonlinearity of AlScN films grown directly on nitrided c-plane sapphire by molecular beam epitaxy. This direct growth approach, which bypasses a thick AlN buffer layer, allows us to isolate the true nonlinear response of the AlScN film. Our results show a large enhancement of d31, but a suppression of d33 in AlScN films compared to AlN. We observe that d31 can be as high as 4.92 pm/V , which is 60 times larger than that of AlN. The development of AlScN-based photonic devices can enable energy-efficient nonlinear optical operations that can be epitaxially integrated with electronic and photonic devices based on Si, GaN and AlN.
Keywords
Cite
@article{arxiv.2607.14590,
title = {Second-Order Optical Nonlinearity of AlScN Films Grown By Molecular Beam Epitaxy},
author = {Joongwon Lee and Thai-Son Nguyen and Len van Deurzen and Debaditya Bhattacharya and Chandrashekhar Savant and Siddhartha Ghosh and Patrick Shea and Carl Bernard and Huili Grace Xing and Debdeep Jena and Farhan Rana},
journal= {arXiv preprint arXiv:2607.14590},
year = {2026}
}
Comments
7 pages, 4 figures