Real-world quantum applications, eg. on-chip quantum networks and quantum cryptography, necessitate large scale integrated single-photon sources with nanoscale footprint for modern information technology. While on-demand and high fidelity implantation of atomic scale single-photon sources in conventional 3D materials suffer from uncertainties due to the crystals dimensionality, layered 2D materials can host point-like centers with inherent confinement to a sub-nm plane. However, previous attempts to truly deterministically control spatial position and spectral homogeneity while maintaining the 2D character have not been realized. Here, we demonstrate the on-demand creation and precise positioning of single-photon sources in atomically thin MoS2 with very narrow ensemble broadening and near-unity fabrication yield. Focused ion beam irradiation creates 100s to 1000s of mono-typical atomistic defects with anti-bunched emission lines with sub-10 nm lateral and 0.7 nm axial positioning accuracy. Our results firmly establish 2D materials as a scalable platform for single-photon emitters with unprecedented control of position as well as photophysical properties owing to the all-interfacial nature.
@article{arxiv.2002.08819,
title = {Scalable single-photon sources in atomically thin MoS2},
author = {Julian Klein and Lukas Sigl and Samuel Gyger and Katja Barthelmi and Matthias Florian and Sergio Rey and Takashi Taniguchi and Kenji Watanabe and Frank Jahnke and Christoph Kastl and Val Zwiller and Klaus D. Jöns and Kai Müller and Ursula Wurstbauer and Jonathan J. Finley and Alexander W. Holleitner},
journal= {arXiv preprint arXiv:2002.08819},
year = {2023}
}