Role of Defect Induced Interfacial States in Molecular Sensing: Ultrahigh- Sensitive Region for Molecular Interaction
Abstract
The defect induced interfacial states are created in an atomically thin two-dimensional molybdenum disulfide channel by underlying a narrow pattern of a graphene layer in a field effect transistor. Nondestructive method for the generation of charge-state allowed a highly sensitive molecular interaction with the sensitivity of nearly three-order of magnitude at room temperature. The presence of interfacial states in the channel lead to a conductance fluctuation and its magnitude is modulated using the nitrogen dioxide gas molecules in the subthreshold region. The study provides a systematic approach to establish a correlation between modulated conductance fluctuation and the molecular concentration upto parts-per-billion. First-principles density functional theory further explains the role of unique interfacial configuration on conductance fluctuation. Therefore, our study demonstrates an experimental approach to induce charge-state for the modulation of carrier concentration and exploits the role of defect induced interfacial states in atomically thin interfaces for the molecular interaction.
Keywords
Cite
@article{arxiv.2102.01596,
title = {Role of Defect Induced Interfacial States in Molecular Sensing: Ultrahigh- Sensitive Region for Molecular Interaction},
author = {Rahul Tripathi and Pritam Bhattacharyya and Alok Shukla and Abha Misra},
journal= {arXiv preprint arXiv:2102.01596},
year = {2021}
}
Comments
27 pages, 4 figures