Relaxation of Cs atomic polarization at surface coatings characterized by X-ray photoelectron spectroscopy
Abstract
Paraffin coatings on glass slides were investigated through both X-ray photoelectron spectroscopy (XPS) and spin relaxation measurement for cesium (Cs) vapor. The components of the glass substrate, such as silicon (Si) and oxygen (O), existed in the XPS spectra of the coated slides, indicating the imperfection of the prepared paraffin coatings. The substrate was not observed after the annealing of the coatings in Cs vapor, which is known as a `ripening' process for spin relaxation measurement. We found a general trend that effective anti-spin relaxation performance requires high paraffin and low Cs coverage on the surface. We also examined a type of diamond-like carbon (DLC) film, anticipating the effect of anti-spin relaxation; our attempts have failed to date.
Keywords
Cite
@article{arxiv.1410.8321,
title = {Relaxation of Cs atomic polarization at surface coatings characterized by X-ray photoelectron spectroscopy},
author = {K. Kushida and T. Niwano and T. Moriya and T. Shimizu and K. Meguro and H. Nakazawa and A. Hatakeyama},
journal= {arXiv preprint arXiv:1410.8321},
year = {2015}
}
Comments
6 pages, 6 figures. v2: an extra figure generated in the first submission has been removed. v3: Final author version for publication on JJAP