Random Deposition Model with a Constant Capture Length
Statistical Mechanics
2007-05-23 v2 Materials Science
Abstract
We introduce a sequential model for the deposition and aggregation of particles in the submonolayer regime. Once a particle has been randomly deposited on the substrate, it sticks to the closest atom or island within a distance \ell, otherwise it sticks to the deposition site. We study this model both numerically and analytically in one dimension. A clear comprehension of its statistical properties is provided, thanks to capture equations and to the analysis of the island-island distance distribution.
Cite
@article{arxiv.cond-mat/0409048,
title = {Random Deposition Model with a Constant Capture Length},
author = {Paolo Politi and Yukio Saito},
journal= {arXiv preprint arXiv:cond-mat/0409048},
year = {2007}
}
Comments
14 pages, minor corrections. Accepted for publication in Progress of Theoretical Physics