Quasiparticle level alignment for photocatalytic interfaces
Abstract
Electronic level alignment at the interface between an adsorbed molecular layer and a semiconducting substrate determines the activity and efficiency of many photocatalytic materials. Standard density functional theory (DFT) based methods have proven unable to provide a quantitative description of this level alignment. This requires a proper treatment of the anisotropic screening, necessitating the use of quasiparticle (QP) techniques. However, the computational complexity of QP algorithms has meant a quantitative description of interfacial levels has remained elusive. We provide a systematic study of a prototypical interface, bare and methanol covered rutile TiO(110) surfaces, to determine the type of many-body theory required to obtain an accurate description of the level alignment. This is accomplished via a direct comparison with metastable impact electron spectroscopy (MIES), ultraviolet photoelectron spectroscopy (UPS) and two-photon photoemission (2PP) spectra. We consider GGA DFT, hybrid DFT and , , , and QP calculations. Our results demonstrate that , or our recently introduced approach, are required to obtain the correct alignment of both highest occupied and lowest unoccupied interfacial molecular levels (HOMO/LUMO). These calculations set a new standard in the interpretation of electronic structure probe experiments of complex organic molecule-semiconductor interfaces.
Keywords
Cite
@article{arxiv.1404.5166,
title = {Quasiparticle level alignment for photocatalytic interfaces},
author = {Annapaoala Migani and Duncan J. Mowbray and Jin Zhao and Hrvoje Petek and Angel Rubio},
journal= {arXiv preprint arXiv:1404.5166},
year = {2014}
}
Comments
10 pages, 11 figures