Probing material absorption and optical nonlinearity of integrated photonic materials
Abstract
Optical microresonators with high quality () factors are essential to a wide range of integrated photonic devices. Steady efforts have been directed towards increasing microresonator factors across a variety of platforms. With success in reducing microfabrication process-related optical loss as a limitation of , the ultimate attainable , as determined solely by the constituent microresonator material absorption, has come into focus. Here, we report measurements of the material-limited factors in several photonic material platforms. High- microresonators are fabricated from thin films of SiO, SiN, AlGaAs and TaO. By using cavity-enhanced photothermal spectroscopy, the material-limited is determined. The method simultaneously measures the Kerr nonlinearity in each material and reveals how material nonlinearity and ultimate vary in a complementary fashion across photonic materials. Besides guiding microresonator design and material development in four material platforms, the results help establish performance limits in future photonic integrated systems.
Keywords
Cite
@article{arxiv.2111.00105,
title = {Probing material absorption and optical nonlinearity of integrated photonic materials},
author = {Maodong Gao and Qi-Fan Yang and Qing-Xin Ji and Heming Wang and Lue Wu and Boqiang Shen and Junqiu Liu and Guanhao Huang and Lin Chang and Weiqiang Xie and Su-Peng Yu and Scott B. Papp and John E. Bowers and Tobias J. Kippenberg and Kerry J. Vahala},
journal= {arXiv preprint arXiv:2111.00105},
year = {2022}
}
Comments
Maodong Gao, Qi-Fan Yang and Qing-Xin Ji contributed equally to this work. 9 pages, 4 figures, 1 table