Plasma double layer development during high power EUV exposure

Manis Chaudhuri; Pavel Krainov; Dmitry Astakhov; Andrei M. Yakunin; Mark van de Kerkhof

Plasma double layer development during high power EUV exposure

Plasma Physics 2026-06-30 v1

Authors: Manis Chaudhuri , Pavel Krainov , Dmitry Astakhov , Andrei M. Yakunin , Mark van de Kerkhof

Abstract

The development of electrostatic plasma double layer (DL) at the boundary of Extreme Ultra Violet (EUV) exposed and un-exposed region in the bulk volume has been confirmed by 3DPIC (Particle-In-Cell) simulations in the context of fast transient high power EUV exposures. It is found that the DL exists only for short time scale during EUV-ON time period (~ 70ns) and disappears soon after EUV is OFF. Such DL fingerprint appears above a certain critical value of EUV beam energy (~ 0.1mJ) and it transforms from weak-to-strong DL with further increase of EUV power.

Cite

@article{arxiv.2606.31797,
  title  = {Plasma double layer development during high power EUV exposure},
  author = {Manis Chaudhuri and Pavel Krainov and Dmitry Astakhov and Andrei M. Yakunin and Mark van de Kerkhof},
  journal= {arXiv preprint arXiv:2606.31797},
  year   = {2026}
}