Photochromic oxygen−containing yttrium−hydride thin films are synthesized by argon−magnetron sputtering on microscope slides. Some of them are encapsulated with a thin, transparent and non−photochromic diffusion-barrier layer of either Al2O3 or Si3N4. Ion beam-based methods prove that these protective diffusion barriers are stable and free from pinholes, with thicknesses of only a few tens of nanometers. Optical spectrophotometry reveals that the photochromic response and relaxation time for both − protected and unprotected − samples are almost identical. Ageing effects in the unprotected films lead to degradation of the photochromic performance (self−delamination) while the photochromic response for the encapsulated films is stable. Our results show that the environment does not play a decisive role for the photochromic process and encapsulation of oxygen containing rare-earth hydride films with transparent and non-organic thin diffusion barrier layers provides long-time stability of the films, mandatory for applications as photochromic coatings on e.g., smart windows.
@article{arxiv.2012.15098,
title = {Photochromic response of encapsulated oxygen-containing yttrium hydride thin films},
author = {Marcos V. Moro and Sigurbjörn M. Aðalsteinsson and Tuan. T. Tran and Dmitrii Moldarev and Ayan Samanta and Max Wolff and Daniel Primetzhofer},
journal= {arXiv preprint arXiv:2012.15098},
year = {2021}
}