English

PaDiM: a Patch Distribution Modeling Framework for Anomaly Detection and Localization

Computer Vision and Pattern Recognition 2020-11-18 v1

Abstract

We present a new framework for Patch Distribution Modeling, PaDiM, to concurrently detect and localize anomalies in images in a one-class learning setting. PaDiM makes use of a pretrained convolutional neural network (CNN) for patch embedding, and of multivariate Gaussian distributions to get a probabilistic representation of the normal class. It also exploits correlations between the different semantic levels of CNN to better localize anomalies. PaDiM outperforms current state-of-the-art approaches for both anomaly detection and localization on the MVTec AD and STC datasets. To match real-world visual industrial inspection, we extend the evaluation protocol to assess performance of anomaly localization algorithms on non-aligned dataset. The state-of-the-art performance and low complexity of PaDiM make it a good candidate for many industrial applications.

Keywords

Cite

@article{arxiv.2011.08785,
  title  = {PaDiM: a Patch Distribution Modeling Framework for Anomaly Detection and Localization},
  author = {Thomas Defard and Aleksandr Setkov and Angelique Loesch and Romaric Audigier},
  journal= {arXiv preprint arXiv:2011.08785},
  year   = {2020}
}

Comments

7 pages, 2 figures, 8 tables, accepted at the 1st International Workshop on Industrial Machine Learning, ICPR 2020

R2 v1 2026-06-23T20:19:21.056Z