This paper explores methods to enhance the reproducibility of Josephson junctions, crucial elements in superconducting quantum technologies, when employing the Dolan technique in 30 kV e-beam processes. The study explores the influence of dose distribution along the bridge area on reproducibility, addressing challenges related to fabrication sensitivity. Experimental methods include E-beam lithography, with electron trajectory simulations shedding light on backscattered electron behavior. We demonstrate the fabrication of different junction geometries, revealing that some geometries significantly improve reproducibility by resulting in a more homogeneous dose distribution over the junction area.
@article{arxiv.2403.19614,
title = {Optimizing Josephson Junction Reproducibility in 30 kV E-beam Lithography: Analysis of Backscattered Electron Distribution},
author = {A. M. Rebello and L. M. Ruela and G. Moreto and N. Y. Klein and E. Martins and I. S. Oliveira and F. Rouxinol and J. P. Sinnecker},
journal= {arXiv preprint arXiv:2403.19614},
year = {2024}
}