Optimal decentralized wavelength control in light sources for lithography
Systems and Control
2024-11-19 v2 Systems and Control
Optimization and Control
Abstract
Pulsed light sources are a critical component of modern lithography, with fine light beam wavelength control paramount for wafer etching accuracy. We study optimal wavelength control by casting it as a decentralized linear quadratic Gaussian (LQG) problem in presence of time-delays. In particular, we consider the multi-optics module (optics and actuators) used for generating the requisite wavelength in light sources as cooperatively interacting systems defined over a directed acyclic graph (DAG). We show that any measurement and other continuous time-delays can be exactly compensated, and the resulting optimal controller implementation at the individual optics-level outperforms any existing wavelength control techniques.
Cite
@article{arxiv.2409.04721,
title = {Optimal decentralized wavelength control in light sources for lithography},
author = {Mruganka Kashyap},
journal= {arXiv preprint arXiv:2409.04721},
year = {2024}
}