English

Optical thermometry based on level anticrossing in silicon carbide

Materials Science 2016-09-22 v1

Abstract

We report a giant thermal shift of 2.12.1 \,MHz/K related to the excited-state zero-field splitting in the silicon vacancy centers in 4H silicon carbide. It is obtained from the indirect observation of the optically detected magnetic resonance in the excited state using the ground state as an ancilla. Alternatively, relative variations of the zero-field splitting for small temperature differences can be detected without application of radiofrequency fields, by simply monitoring the photoluminescence intensity in the vicinity of the level anticrossing. This effect results in an all-optical thermometry technique with temperature sensitivity of 100100 \,mK/Hz1/2^{1/2} for a detection volume of approximately 10610^{-6} \,mm3^{3}. In contrast, the zero-field splitting in the ground state does not reveal detectable temperature shift. Using these properties, an integrated magnetic field and temperature sensor can be implemented on the same center.

Keywords

Cite

@article{arxiv.1609.06451,
  title  = {Optical thermometry based on level anticrossing in silicon carbide},
  author = {A. N. Anisimov and D. Simin and V. A. Soltamov and S. P. Lebedev and P. G. Baranov and G. V. Astakhov and V. Dyakonov},
  journal= {arXiv preprint arXiv:1609.06451},
  year   = {2016}
}

Comments

4 pages, 3 figures

R2 v1 2026-06-22T15:56:15.747Z