Non-perturbative cathodoluminescence microscopy of beam-sensitive materials
Abstract
Cathodoluminescence microscopy is now a well-established and powerful tool for probing the photonic properties of nanoscale materials, but in many cases, nanophotonic materials are easily damaged by the electron-beam doses necessary to achieve reasonable cathodoluminescence signal-to-noise ratios. Two-dimensional materials have proven particularly susceptible to beam-induced modifications, yielding both obstacles to high spatial-resolution measurement and opportunities for beam-induced patterning of quantum photonic systems. Here pan-sharpening techniques are applied to cathodoluminescence microscopy in order to address these challenges and experimentally demonstrate the promise of pan-sharpening for minimally-perturbative high-spatial-resolution spectrum imaging of beam-sensitive materials.
Keywords
Cite
@article{arxiv.2412.11413,
title = {Non-perturbative cathodoluminescence microscopy of beam-sensitive materials},
author = {Malcolm Bogroff and Gabriel Cowley and Ariel Nicastro and David Levy and Yueh-Chun Wu and Nannan Mao and Tilo H. Yang and Tianyi Zhang and Jing Kong and Rama Vasudevan and Kyle P. Kelley and Benjamin J. Lawrie},
journal= {arXiv preprint arXiv:2412.11413},
year = {2024}
}