Non linear flux flow in TiN superconducting thin film

F. Lefloch; C. Hoffmann; O. Demolliens

doi:10.1016/S0921-4534(99)00297-X

Non linear flux flow in TiN superconducting thin film

Superconductivity 2009-10-31 v2 Materials Science

Authors: F. Lefloch , C. Hoffmann , O. Demolliens

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Abstract

We have studied the superconducting behavior of 100 nm Titanium Nitride (TiN) thin film in a perpendicular magnetic field. We found a zero field transition temperature of 4.6 K and a slope in the H-T plane of -0.745 T/K. At 4.2 K, we have performed careful transport measurements by measuring both the differential resistivity and voltage as a function of a DC current. Our results are analyzed in the framework of linear and non linear flux flow behavior. In particular, we have observed an electronic instability at high vortex velocities and from its dependence with respect to the applied magnetic field, we can exctract the inelastic scattering time and diffusion length of the quasiparticles.

Keywords

superconductivity flux flow TiN thin film nonlinear transport vortex dynamics

Cite

@article{arxiv.cond-mat/9903060,
  title  = {Non linear flux flow in TiN superconducting thin film},
  author = {F. Lefloch and C. Hoffmann and O. Demolliens},
  journal= {arXiv preprint arXiv:cond-mat/9903060},
  year   = {2009}
}

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