Nano-sculptured thin film thickness variation with incidence angle
Materials Science
2007-05-23 v1 Other Condensed Matter
Abstract
In-situ monitoring and calibration of nano-sculptured thin film thickness is a critical problem due to substrate tilt angle dependent porosity and mass flux. In this letter we present an analytical model for thickness dependence on fabrication parameters for nano-sculptured films. The generality of the model includes universal Gaussian-type flux distribution, non-unity sticking coefficients, variable off-axis sensor location, and substrate tilt. The resulting equation fits well the experimental data. The results can be particularized for films deposited at normal incidence
Keywords
Cite
@article{arxiv.cond-mat/0412256,
title = {Nano-sculptured thin film thickness variation with incidence angle},
author = {Cristina Buzea and Kevin Robbie},
journal= {arXiv preprint arXiv:cond-mat/0412256},
year = {2007}
}
Comments
5 pages, 4 figures, nanotechnology, nanomaterials