Multiscale Random-Walk Algorithm for Simulating Interfacial Pattern Formation
Materials Science
2009-10-31 v2 Statistical Mechanics
Abstract
We present a novel computational method to simulate accurately a wide range of interfacial patterns whose growth is limited by a large scale diffusion field. To illustrate the computational power of this method, we demonstrate that it can be used to simulate three-dimensional dendritic growth in a previously unreachable range of low undercoolings that is of direct experimental relevance.
Cite
@article{arxiv.cond-mat/9906370,
title = {Multiscale Random-Walk Algorithm for Simulating Interfacial Pattern Formation},
author = {Mathis Plapp and Alain Karma},
journal= {arXiv preprint arXiv:cond-mat/9906370},
year = {2009}
}
Comments
4 pages RevTex, 6 eps figures; substantial changes in presentation, but results and conclusions remain the same