Multiperiodic magnetoplasmonic gratings fabricated by the pulse force nanolithography
Optics
2021-09-01 v1
Abstract
We propose a novel technique for the magnetoplasmonic nanostructures fabrication based on the pulse force nanolithography method. It allows one to create the high-quality magnetoplasmonic nanostructures that have lower total losses than the gratings made by the electron beam lithography. The method provides control of the SPP excitation efficiency by varying the grating parameters such as the scratching depth or the number of the scratches in a single period. The quality of the plasmonic gratings was estimated by means of the transverse magneto-optical Kerr effect that is extremely sensitive to the finesse of a plasmonic structure.
Keywords
Cite
@article{arxiv.2106.12289,
title = {Multiperiodic magnetoplasmonic gratings fabricated by the pulse force nanolithography},
author = {Savelii V. Lutsenko and Mikhail A. Kozhaev and Olga V. Borovkova and Andrey N. Kalish and Alexei G. Temiryazev and Sarkis A. Dagesyan and Vladimir N. Berzhansky and Alexander N. Shaposhnikov and Alexei N. Kuzmichev and Vladimir I. Belotelov},
journal= {arXiv preprint arXiv:2106.12289},
year = {2021}
}