Microwave power coupling in a surface wave excited plasma
Plasma Physics
2014-11-13 v1
Abstract
In recent decades, different types of plasma sources have been used for various types of plasma processing, such as, etching and thin film deposition. The critical parameter for effective plasma processing is high plasma density. One type of high density plasma source is Microwave sheath-Voltage combination Plasma (MVP). In the present investigation, a better design of MVP source is reported, in which over-dense plasma is generated for low input microwave powers. The results indicate that the length of plasma column increases significantly with increase in input microwave power.
Cite
@article{arxiv.1411.3072,
title = {Microwave power coupling in a surface wave excited plasma},
author = {Satyananda Kar and Lukas Alberts and Hiroyuki Kousaka},
journal= {arXiv preprint arXiv:1411.3072},
year = {2014}
}
Comments
10 pages, 5 figures