We present a study of the superconducting penetration depth λ in aluminum thin films of varying thickness. The range of thicknesses chosen spans from the thin-film regime to the regime approaching bulk behavior. The penetration depths observed range from λ=163.3±0.4nm for the thinnest 20nm samples down to λ=53.6±0.4nm for the 200nm-thick ones. In order to accurately determine λ, we performed complementary measurements using the frequency of superconducting LC resonators as well as the resistance of normal-state meanders. Both methods yield comparable results, providing a well-characterized set of values of λ in aluminum in the relevant range for applications in fields such as quantum computing and microwave radiation detector technologies.
@article{arxiv.2311.14119,
title = {Magnetic penetration depth of Aluminum thin films},
author = {David López-Núñez and Alba Torras-Coloma and Queralt Portell Montserrat and Elia Bertoldo and Luca Cozzolino and Gemma Rius and M. Martínez and P. Forn-Díaz},
journal= {arXiv preprint arXiv:2311.14119},
year = {2025}
}