English

Longitudinal conductivity in Si/SiGe heterostructure at integer filling factors

Mesoscale and Nanoscale Physics 2009-11-10 v1

Abstract

We have investigated temperature dependence of the longitudinal conductivity σxx\sigma_{xx} at integer filling factors ν=i\nu =i for Si/SiGe heterostructure in the quantum Hall effect regime. It is shown that for odd ii, when the Fermi level EFE_{F} is situated between the valley-split levels, Δσxx\Delta \sigma_{xx} is determined by quantum corrections to conductivity caused by the electron-electron interaction: Δσxx(T)lnT\Delta\sigma_{xx}(T)\sim \ln T. For even ii, when EFE_{F} is located between cyclotron-split levels or spin-split levels, σxxexp[Δi/T]\sigma_{xx}\sim \exp[-\Delta_{i}/T] for i=6,10,12i=6,10,12 and exp[(T0i/T)]1/2\sim \exp [-(T_{0i}/T)]^{1/2} for i=4,8i=4,8. For further decrease of TT, all dependences σxx(T)\sigma_{xx}(T) tend to almost temperature-independent residual conductivity σi(0)\sigma_{i}(0). A possible mechanism for σi(0)\sigma_{i}(0) is discussed.

Keywords

Cite

@article{arxiv.cond-mat/0307695,
  title  = {Longitudinal conductivity in Si/SiGe heterostructure at integer filling factors},
  author = {I. Shlimak and V. Ginodman and M. Levin and M. Potemski and D. K. Maude and K. -J. Friedland and D. J. Paul},
  journal= {arXiv preprint arXiv:cond-mat/0307695},
  year   = {2009}
}

Comments

6 pages, 8 figures (included), accepted in Phys. Rev. B