English

Localization Phenomena in Disordered Tantalum Films

Strongly Correlated Electrons 2021-12-23 v1

Abstract

Using dc transport and wide-band spectroscopic ellipsometry techniques we study localization phenomena in highly disordered metallic \beta-Ta films grown by rf sputtering deposition. The dc transport study implies non-metallic behavior (dr/dT<0), with negative temperature coefficient of resistivity (TCR). We found that as the absolute TCR value increased, specifying an elevated degree of disorder, the free charge carrier Drude response decreases, indicating the enhanced charge carrier localization. Moreover, we found that the pronounced changes occur at the extended spectral range, involving not only the Drude resonance, but also the higher-energy Lorentz bands, in evidence of the attendant electronic correlations. We propose that the charge carrier localization, or delocalization, is accompanied by the pronounced electronic band structure reconstruction due to many-body effects, which may be the key feature for understanding the physics of highly disordered metals.

Keywords

Cite

@article{arxiv.2112.12030,
  title  = {Localization Phenomena in Disordered Tantalum Films},
  author = {Natalia Kovaleva and Dagmar Chvostova and A. Dejneka},
  journal= {arXiv preprint arXiv:2112.12030},
  year   = {2021}
}

Comments

19 pages, 5 figures, 1 table

R2 v1 2026-06-24T08:28:13.955Z