Finding a suitable layout represents a crucial task for diverse applications in graphic design. Motivated by simpler and smoother sampling trajectories, we explore the use of Flow Matching as an alternative to current diffusion-based layout generation models. Specifically, we propose LayoutFlow, an efficient flow-based model capable of generating high-quality layouts. Instead of progressively denoising the elements of a noisy layout, our method learns to gradually move, or flow, the elements of an initial sample until it reaches its final prediction. In addition, we employ a conditioning scheme that allows us to handle various generation tasks with varying degrees of conditioning with a single model. Empirically, LayoutFlow performs on par with state-of-the-art models while being significantly faster.
@article{arxiv.2403.18187,
title = {LayoutFlow: Flow Matching for Layout Generation},
author = {Julian Jorge Andrade Guerreiro and Naoto Inoue and Kento Masui and Mayu Otani and Hideki Nakayama},
journal= {arXiv preprint arXiv:2403.18187},
year = {2024}
}
Comments
Accepted to ECCV 2024, Project Page: https://julianguerreiro.github.io/layoutflow/