Kinetic Activation Relaxation Technique
Abstract
We present a detailed description of the kinetic Activation-Relaxation Technique (k-ART), an off-lattice, self-learning kinetic Monte Carlo algorithm with on-the-fly event search. Combining a topological classification for local environments and event generation with ART nouveau, an efficient unbiased sampling method for finding transition states, k-ART can be applied to complex materials with atoms in off-lattice positions or with elastic deformations that cannot be handled with standard KMC approaches. In addition to presenting the various elements of the algorithm, we demonstrate the general character of k-ART by applying the algorithm to three challenging systems: self-defect annihilation in c-Si (crystalline silicon), self-interstitial diffusion in Fe and structural relaxation in a-Si (amorphous silicon).
Cite
@article{arxiv.1107.2417,
title = {Kinetic Activation Relaxation Technique},
author = {Laurent Karim Béland and Peter Brommer and Fedwa El-Mellouhi and Jean-François Joly and Normand Mousseau},
journal= {arXiv preprint arXiv:1107.2417},
year = {2011}
}
Comments
13 pages, 11 figures. Final version as published, Figs. 6 and 7 exchanged, minor typographical and stylistic corrections