Two-dimensional (2D) materials have been studied extensively as monolayers 1-5, vertical or lateral heterostructures 6-8. To achieve functionalization, monolayers are often patterned using soft lithography and selectively decorated with molecules 9,10. Here we demonstrate the growth of a family of 2D materials that are intrinsically patterned. We demonstrate that a monolayer of PtSe2 can be grown on a Pt substrate in the form of a triangular pattern of alternating 1T and 1H phases. Moreover, we show that, in a monolayer of CuSe grown on a Cu substrate, strain relaxation leads to periodic patterns of triangular nanopores with uniform size. Adsorption of different species at preferred pattern sites is also achieved, demonstrating that these materials can serve as templates for selective self-assembly of molecules or nanoclusters, as well as for the functionalization of the same substrate with two different species.
@article{arxiv.2004.02433,
title = {Intrinsically patterned two-dimensional materials for selective adsorption of molecules and nanoclusters},
author = {X Lin and JC Lu and Y Shao and YY Zhang and X Wu and JB Pan and L Gao and SY Zhu and K Qian and YF Zhang and DL Bao and LF Li and YQ Wang and ZL Liu and JT Sun and T Lei and C Liu and JO Wang and K Ibrahim and DN Leonard and W Zhou and HM Guo and YL Wang and SX Du and ST Pantelides and H-J Gao},
journal= {arXiv preprint arXiv:2004.02433},
year = {2020}
}