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Intrinsic Electronic Defect States of Anatase using Density Functional Theory

Materials Science 2021-03-12 v2

Abstract

In this work an overall electronic structure including the position and formation energies of various intrinsic defects are computed for anatase using Density Functional Theory aided by Hubbard correction (DFT+U). The intrinsic point defects considered here are, oxygen vacancy (VOV_O), oxygen interstitial (OiO_i), titanium vacancy (VTiV_{Ti}) and titanium interstitial (TiiTi_i). Out of all the intrinsic defects considered here, VTiV_{Ti} and TiiTi_i are found to be most stable under equilibrium condition. Whereas, conduction band in anatase is consisted of mainly Ti 3d with a minor component of O 2p states, valence band is found to be mainly composed of O 2p with a minor contribution from Ti 3d states. VOV_O and TiiTi_i are found to form localized states in the band gap. Moreover, anisotropy in the effective mass is seen. Finally, an alignment of band diagrams for all the intrinsic defect states is performed using vacuum potential from slab-supercell calculation as reference. This first principle study would help in the understanding of defect-induced insulating to conducting transition in anatase, which would have significant impact in the photocatalytic and optoelectronic area.

Keywords

Cite

@article{arxiv.2002.05351,
  title  = {Intrinsic Electronic Defect States of Anatase using Density Functional Theory},
  author = {Abhishek Raghav and Adie Tri Hanindriyo and Keishu Utimula and Mohaddeseh Abbasnejad and Ryo Maezono and Emila Panda},
  journal= {arXiv preprint arXiv:2002.05351},
  year   = {2021}
}

Comments

31 pages, 10 figures; Shortened article to include only intrinsic defects, improved DOS plots, included result from mBJ calculation in Table 1