Innovating at Speed and at Scale: A Next Generation Infrastructure for Accelerating Semiconductor Technologies
Abstract
Semiconductor innovation drives improvements to technologies that are critical to modern society. The country that successfully accelerates semiconductor innovation is positioned to lead future semiconductor-driven industries and benefit from the resulting economic growth. It is our view that a next generation infrastructure is necessary to accelerate and enhance semiconductor innovation in the U.S. In this paper, we propose such an advanced infrastructure composed of a national network of facilities with enhancements in technology and business models. These enhancements enable application-driven and challenge-based research and development, and ensure that facilities are accessible and sustainable. The main tenets are: a challenge-driven operational model, a next-generation infrastructure to serve that operational model, technology innovations needed for advanced facilities to speed up learning cycles, and innovative cost-effective business models for sustainability. Ultimately, the expected outcomes of such a participatory, scalable, and sustainable nation-level advanced infrastructure will have tremendous impact on government, industry, and academia alike.
Cite
@article{arxiv.2204.02216,
title = {Innovating at Speed and at Scale: A Next Generation Infrastructure for Accelerating Semiconductor Technologies},
author = {Richard A. Gottscho and Edlyn V. Levine and Tsu-Jae King Liu and Paul C. McIntyre and Subhasish Mitra and Boris Murmann and Jan M. Rabaey and Sayeef Salahuddin and Willy C. Shih and H. -S. Philip Wong},
journal= {arXiv preprint arXiv:2204.02216},
year = {2022}
}