High Speed Precise Refractive Index Modification for Photonic Chips through Phase Aberrated Pulsed Lasers
Abstract
Integrated photonic chips have significant potential in telecommunications, classic computing, quantum systems, and topological photonics. Direct laser writing offers unique capability for creating three-dimensional photonic devices in an optical glass chip with quick prototyping. However, existing laser writing schemes cannot create index-modified structures in glass that precisely match the laser focal shape while also achieving high scanning speed and high refractive index contrast. Here, we introduce the theory of a refractive index modification scheme that combines the advantages of both traditional non-thermal and thermal regime fabrication methods. We also propose a model of waveguide formation that was verified through a thorough study on the effects of phase aberrations on the laser focus. The presented new photonic chip fabrication scheme uses a novel focal intensity distribution, where pulse energy is relocated to the bottom of a laser focus by manipulating primary and higher order spherical aberrations. The technique can produce index modifications with high scanning speed (20 mm/s or higher), high index contrast (16 x 10-3), and high precision to fabricate with arbitrary cross-sections. This method has potential to expand the capabilities of photonic chips in applications that require small-scale, high precision, or high contrast refractive index control.
Keywords
Cite
@article{arxiv.2307.14451,
title = {High Speed Precise Refractive Index Modification for Photonic Chips through Phase Aberrated Pulsed Lasers},
author = {Bangshan Sun and Simon Moser and Alexander Jesacher and Patrick S. Salter and Robert R. Thomson and Martin J. Booth},
journal= {arXiv preprint arXiv:2307.14451},
year = {2023}
}