High resolution large working distance scanning helium microscopy
Abstract
Scanning helium microscopy (SHeM) is attractive for imaging delicate and insulating surfaces because it combines a non-destructive neutral-atom probe with strong surface sensitivity. However, large-working-distance pinhole instruments have so far been limited in spatial resolution. Here we report sub-micron resolution in a large-working-distance pinhole SHeM, with an intrinsic beamwidth of 340nm achieved at working distances of 770 {\mu}m to 850 {\mu}m. This sixfold improvement over our previous long-working-distance configuration is enabled by constrained optimisation of the atom optics together with a redesigned high-resolution pinhole-plate, a reduced pinhole diameter, an increased source--pinhole distance and a larger detector aperture. Beamwidth measurements agree well with the modified optimisation model and show that geometric, source-size and diffraction terms now contribute on a similar footing, placing the instrument in a near-optimised regime. The resulting combination of sub-micron beam size, useful depth of field and practical sample access is demonstrated on bacterial specimens and eroded diamond. The work establishes large-working-distance pinhole SHeM as a viable sub-micron imaging platform and extends its usefulness for topographic imaging and micro-diffraction applications.
Keywords
Cite
@article{arxiv.2605.19930,
title = {High resolution large working distance scanning helium microscopy},
author = {Sam M Lambrick and Nick A von Jeinsen and Alek Radić and David J Ward and Donald MacLaren and Andrew P Jardine},
journal= {arXiv preprint arXiv:2605.19930},
year = {2026}
}