English

Formation and migration of native defects in NaAlH$_4$

Materials Science 2014-12-16 v1

Abstract

We present a first-principles study of native defects in NaAlH4_4. Our analysis indicates that the structure and energetics of these defects can be interpreted in terms of elementary building blocks, which include VAlH4+V_{\rm{AlH_4}}^+, VNaV_{\rm{Na}}^-, VH+V_{\rm{H}}^+, Hi_i^-, and (H2_2)i_i. We also calculate migration barriers for several key defects, in order to compare enthalpies of diffusion to experimentally measured activation energies of desorption. From this, we estimate activation energies for diffusion of defects and defect pairs. We suggest that VAlH4+V_{\rm{AlH_4}}^+ and Hi_i^-, or VNaV_{\rm{Na}}^- and VH+V_{\rm{H}}^+, may be responsible for diffusion necessary for desorption. We discuss the possible role of VH+V_{\rm{H}}^+-Hi_i^- complex formation. The values we find are in the range of activation energies reported for catalyzed desorption.

Keywords

Cite

@article{arxiv.0911.2813,
  title  = {Formation and migration of native defects in NaAlH$_4$},
  author = {Gareth B. Wilson-Short and Anderson Janotti and Khang Hoang and Amra Peles and Chris G. Van de Walle},
  journal= {arXiv preprint arXiv:0911.2813},
  year   = {2014}
}

Comments

26 pages, 8 figures, 1 table; to appear in Phys. Rev. B 80 (2009)