In this work we present an application of the lambda-phi^4 field theoretical model to the adsorption of atoms and molecules on metallic surfaces - the electrochemical deposition. The usual approach to this system consists in the computational simulation using Monte Carlo techniques of an effective lattice-gas Hamiltonian. We construct an effective model towards a comparison between the lattice-gas Hamiltonian and the discrete version of the lambda-phi^4 Hamiltonian, obtaining the relationships between the model parameters and electrochemical quantities. The lambda-phi^4 model is studied in the mean field approximation, and the results are fitted and compared to numerical simulated and experimental data.
@article{arxiv.cond-mat/0404225,
title = {Field Theoretical Approach to Electrochemical Deposition},
author = {H. A. Taroco and A. L. Mota},
journal= {arXiv preprint arXiv:cond-mat/0404225},
year = {2009}
}