In this paper we demonstrate experimentally that crystalline phases appear in amorphous titanium oxide upon processing with ultrafast laser pulses. Amorphous titanium thin films were produced by plasma-enhanced chemical vapor deposition (PECVD) and exposed to femtosecond laser pulses. Formation of rutile phase was confirmed by X-ray diffraction, Raman measurements and electron backscattering diffraction. A rang of processing parameters for the crystallization is reported and possible background mechanisms are discussed.
@article{arxiv.1808.05061,
title = {Femtosecond laser crystallization of amorphous titanium oxide thin films},
author = {Jan S. Hoppius and Danny Bialuschewski and Sanjay Mathur and Andreas Ostendorf and Evgeny L. Gurevich},
journal= {arXiv preprint arXiv:1808.05061},
year = {2018}
}