We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binominal states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1)×(N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.
@article{arxiv.quant-ph/0011075,
title = {Entangled-State Lithography: Tailoring any Pattern with a Single State},
author = {Gunnar Bjork and Luis L. Sanchez-Soto and Jonas Soderholm},
journal= {arXiv preprint arXiv:quant-ph/0011075},
year = {2007}
}