Embedded metal nanopatterns for near-field scattering-enhanced optical absorption
Abstract
Simulations of metal nanopatterns embedded in a thin photovoltaic absorber show significantly enhanced absorbance within the semiconductor, with a more than 300% increase for {\lambda} = 800 nm. Integrating with AM1.5 solar irradiation, this yields a 70% increase in simulated short circuit current density in a 60 nm amorphous silicon film. Embedding such metal patterns inside an absorber maximally utilizes enhanced electric fields that result from intense, spatially organized, near-field scattering in the vicinity of the pattern. Appropriately configured (i.e. with a thin insulating coating), this optical metamedium architecture may be useful for increasing photovoltaic efficiency in thin film solar cells, including offering prospects for realistic ultrathin hot electron cells.
Keywords
Cite
@article{arxiv.1208.4560,
title = {Embedded metal nanopatterns for near-field scattering-enhanced optical absorption},
author = {Fan Ye and Michael J. Burns and Michael J. Naughton},
journal= {arXiv preprint arXiv:1208.4560},
year = {2012}
}
Comments
Accepted for publication in Phys. Status Solidi A (2012). 17 pp, 3 figs