English

Electron transport in ZnO thin films

Materials Science 2009-11-11 v1

Abstract

Epitaxial, n-type ZnO films grown by a laser molecular-beam epitaxy method were investigated by the temperature-dependent Hall-effect technique. The 300-K carrier concentration and mobility were about ns1016n_s \sim 10^{16} cm3^{-3} and 440 cm2^{2}/Vs, respectively. Transport characteristics are calculated by solving the Boltzmann transport equation using a variational method. Mobility limit of 430 cm2^{2}/Vs was calculated at 300 K. The temperature dependence of the mobility for an undoped film is calculated and agrees favorably well with experimental data if physical parameters are chosen so as to approach to those. In the experimental `mobility vs concentration' curve, unusual phenomenon was observed, i.e., mobilities at ns5×n_s \sim 5\times 1018^{18} cm3^{-3} are significantly smaller than those at higher densities above 1020\sim 10^{20} cm3^{-3}. It is qualitatively explained in terms of electron-plasmon interaction.

Keywords

Cite

@article{arxiv.cond-mat/0507009,
  title  = {Electron transport in ZnO thin films},
  author = {T. Makino and Y. Segawa and A. Tsukazaki and A. Ohtomo and M. Kawasaki},
  journal= {arXiv preprint arXiv:cond-mat/0507009},
  year   = {2009}
}

Comments

about 9 pages, 2 figures, 1 table, RevTex, to appear in the July 18th issue of Appl. Phys. Lett

R2 v1 2026-07-22T11:19:18.290Z