English

Electron impact collision strengths in Si IX, Si X and Si XI

Atomic Physics 2015-06-26 v1

Abstract

Electron impact collision strengths among 560 levels of Si IX, 320 levels of Si X and 350 levels of Si XI have been calculated using the Flexible Atomic Code (FAC) of Gu (2003). Collision strengths Ω\Omega at ten scattered electron energies covering an entire energy range, namely 10, 50, 100, 200, 400, 600, 800, 1000, 1500 and 2000 eV, are reported. Assuming a Maxwellian energy distribution, effective collision strengths Υ\Upsilon are obtained at a finer electron temperature grids of 0.5, 1.0, 2.0, 3.0, 4.0, 5.0 and 6.0 MK, which covers the typical temperature range of astrophysical hot plasma. Additionally, radiative rates AA and weighted oscillator strengths gfgf are given for more possible transitions among these levels. Comparisons of our results with available predictions reported in earlier literatures are made, and the accuracy of the data is assessed. Most transitions exhibit a better agreement, whereas large differences in gfgf appear for a few cases, which are due to the different inclusion of configuration interaction in different theoretical calculations. In excitations among levels of ground and lower excited configurations, large discrepancies of Υ\Upsilon maybe resulted from the consideration of resonance effects in earlier works.

Keywords

Cite

@article{arxiv.physics/0608111,
  title  = {Electron impact collision strengths in Si IX, Si X and Si XI},
  author = {Guiyun Liang and Gang Zhao and Jiaolong Zeng},
  journal= {arXiv preprint arXiv:physics/0608111},
  year   = {2015}
}

Comments

42 pages, 7 figures, in press of Atom. Data and Nucl. Data Tables