Electron Emission Yield Datasets Under Electron Impact From Surfaces Characterized In Situ by XPS or AES
Applied Physics
2025-12-10 v1 Materials Science
Abstract
We present the measurement, characterization, and calibration procedures used to produce a series of datasets for various conductive and semiconductive materials. The data, provided, include emission yields as a function of incident electron energy together with surface composition obtained from X-Ray Photoelectron Spectroscopy or Auger Electron Spectroscopy analyses. Initial datasets cover copper and gold, with additional materials to be released on arXiv.
Keywords
Cite
@article{arxiv.2512.08693,
title = {Electron Emission Yield Datasets Under Electron Impact From Surfaces Characterized In Situ by XPS or AES},
author = {M. Belhaj and S. dadouch},
journal= {arXiv preprint arXiv:2512.08693},
year = {2025}
}
Comments
The objectif is to provide TEEY data