Electrically-pumped near-infrared VCSEL epitaxially-grown on Si

The monolithic integration of compact laser sources onto silicon remains a critical bottleneck for the scalable development of silicon photonics. In particular, the direct epitaxial growth of near-infrared vertical-cavity surface-emitting lasers (VCSELs) on silicon has long been hindered by the simultaneous requirements of low crystalline defect density in the active region and smooth interfaces in the distributed Bragg reflector (DBR) mirrors, both essential to achieving high cavity quality factors and low lasing thresholds. Here, we report the direct epitaxial integration of near-infrared VCSELs on silicon substrates using a two-step growth strategy specifically designed to suppress defect propagation while preserving mirror interface abruptness. This approach enables effective confinement of threading dislocations away from the active region and ensures high-reflectivity DBRs with excellent structural uniformity. Structural and optical characterizations reveal an epitaxial stack of high crystalline quality, leading to laser performance comparable to VCSELs commonly grown on GaAs substrates. We demonstrate, for the first time, directly grown VCSELs on silicon wafers exhibiting threshold currents of only a few milliamperes. These results establish a decisive proof of concept for the monolithic integration of good-performance VCSELs onto silicon platforms and open a viable pathway toward fully integrated, low-cost silicon-based photonic systems.