Dynamical model for the formation of patterned deposits at receding contact lines
Fluid Dynamics
2011-06-24 v1
Abstract
We describe the formation of deposition patterns that are observed in many different experiments where a three-phase contact line of a volatile nanoparticle suspension or polymer solution recedes. A dynamical model based on a long-wave approximation predicts the deposition of irregular and regular line patterns due to self-organised pinning-depinning cycles corresponding to a stick-slip motion of the contact line. We analyze how the line pattern properties depend on the evaporation rate and solute concentration.
Keywords
Cite
@article{arxiv.1008.4334,
title = {Dynamical model for the formation of patterned deposits at receding contact lines},
author = {Lubor Frastia and Andrew J. Archer and Uwe Thiele},
journal= {arXiv preprint arXiv:1008.4334},
year = {2011}
}