We report for the first time the direct growth of Molybdenum disulfide (MoS2) monolayers on nanostructured silicon-on-insulator waveguides. Our results indicate the possibility of utilizing the Chemical Vapour Deposition (CVD) on nanostructured photonic devices in a scalable process. Direct growth of 2D material on nanostructures rectifies many drawbacks of the transfer-based approaches. We show that the van der Waals materials grow conformally across the curves, edges, and the silicon-SiO2 interface of the waveguide structure. Here, the waveguide structure used as a growth substrate is complex not just in terms of its geometry but also due to the two materials (Si and SiO2) involved. A transfer-free method like this yields a novel approach for functionalizing nanostructured, integrated optical architectures with an optically active direct semiconductor.
@article{arxiv.2206.02526,
title = {Direct Growth of Monolayer MoS$_2$ on Nanostructured Silicon Waveguides},
author = {Athira Kuppadakkath and Emad Najafidehaghani and Ziyang Gan and Alessandro Tuniz and Gia Quyet Ngo and Heiko Knopf and Franz J. F. Löchner and Fatemeh Abtahi and Tobias Bucher and Sai Shradha and Thomas Käsebier and Stefano Palomba and Nadja Felde and Pallabi Paul and Tobias Ullsperger and Sven Schröder and Adriana Szeghalmi and Thomas Pertsch and Isabelle Staude and Uwe Zeitner and Antony George and Andrey Turchanin and Falk Eilenberger},
journal= {arXiv preprint arXiv:2206.02526},
year = {2022}
}