Precise and scalable defect engineering of 2D nanomaterials is acutely sought-after in contemporary materials science. Here we present defect engineering in monolayer graphene and molybdenum disulfide (MoS2) by irradiation with noble gas ions at 30 keV. Two ion species of different masses were used in a gas field ion source microscope: helium (He+) and neon (Ne+). A detailed study of the introduced defect sizes and resulting inter-defect distance with escalating ion dose was performed using Raman spectroscopy. Expanding on existing models, we found that the average defect size is considerably smaller for supported than freestanding graphene and that the rate of defect production is larger. We conclude that secondary atoms from the substrate play a significant role in defect production, creating smaller defects relative to those created by the primary ion beam. Furthermore, a similar model was also applied to supported MoS2, another promising member of the 2D material family. Defect yields for both ions were obtained for MoS2, demonstrating their different interaction with the material and facilitating comparison with other irradiation conditions in the literature.
@article{arxiv.1707.08893,
title = {Defect Sizing, Separation and Substrate Effects in Ion-Irradiated Monolayer 2D Materials},
author = {Pierce Maguire and Daniel S. Fox and Yangbo Zhou and Qianjin Wang and Maria O'Brien and Jakub Jadwiszczak and Conor P. Cullen and John McManus and Niall McEvoy and Georg S. Duesberg and Hongzhou Zhang},
journal= {arXiv preprint arXiv:1707.08893},
year = {2018}
}