We report magnetotransport measurements of the critical field behavior of thin Al films deposited onto multiply connected substrates. The substrates were fabricated via a standard electrochemical process that produced a triangular array of 66 nm diameter holes having a lattice constant of 100 nm. The critical field transition of the Al films was measured near Tc as a function of field orientation relative to the substrate normal. With the field oriented along the normal (θ=0), we observe reentrant superconductivity at a characteristic matching field Hm=0.22T, corresponding to one flux quantum per hole. In tilted fields, the position H∗ of the reentrance feature increases as sec(θ), but the resistivity traces are somewhat more complex than those of a continuous superconducting film. We show that when the tilt angle is tuned such that H∗ is of the order of the upper critical field Hc, the entire critical region is dominated by the enhanced dissipation associated with a sub-matching perpendicular component of the applied field. At higher tilt angles a local maximum in the critical field is observed when the perpendicular component of the field is equal to the matching field.
@article{arxiv.1911.11424,
title = {Critical field behavior of a multiply connected superconductor in a tilted magnetic field},
author = {F. N. Womack and P. W. Adams and J. M. Valles and G. Catelani},
journal= {arXiv preprint arXiv:1911.11424},
year = {2019}
}