Critical behavior of roughening transitions in parity-conserving growth processes
Abstract
We investigate a class of parity-conserving solid-on-solid models which describe the growth of an interface by the deposition and evaporation of dimers. As a key feature of the models, evaporation of dimers takes place only at the edges of terraces, leading to a roughening transition between a smooth and a rough phase. We consider several variants of growth models in order to identify universal and nonuniversal properties. Moreover, a parity-conserving polynuclear growth model is proposed. All variants display the same type of universal critical behavior at the roughening transition. Because of parity-conservation, the critical behavior at the first few layers can be explained in terms of unidirectionally coupled branching annihilating random walks with even number of offspring.
Keywords
Cite
@article{arxiv.cond-mat/9905212,
title = {Critical behavior of roughening transitions in parity-conserving growth processes},
author = {Haye Hinrichsen and Geza Odor},
journal= {arXiv preprint arXiv:cond-mat/9905212},
year = {2009}
}
Comments
12 pages, RevTeX, including 13 encapsulated postscript figures