Coherent scattering from silicon mocrystal surface

F. Livet; G. Beutier; M. de Boissieu; S. Ravy; F. Picca; D. Le Bolloc'h; V. Jacques

Coherent scattering from silicon mocrystal surface

Materials Science 2009-08-12 v1

Authors: F. Livet , G. Beutier , M. de Boissieu , S. Ravy , F. Picca , D. Le Bolloc'h , V. Jacques

Abstract

Using coherent x-ray scattering, we evidenced atomic step roughness at the [111] vicinal surface of a silicon monocrystal of 0.05 degree miscut. Close to the (1/2 1/2 1/2) anti-Bragg position of the reciprocal space which is particularly sensitive to the [111] surface, the truncation rod exhibits a contrasted speckle pattern that merges into a single peak closer to the (111) Bragg peak of the bulk. The elongated shape of the speckles along the[111] direction confirms the monoatomic step sensibility of the technique. This experiment opens the way towards studies of step dynamics on crystalline surfaces.

Keywords

surface science silicon physics crystal structure and quasicrystals

Cite

@article{arxiv.0908.1536,
  title  = {Coherent scattering from silicon mocrystal surface},
  author = {F. Livet and G. Beutier and M. de Boissieu and S. Ravy and F. Picca and D. Le Bolloc'h and V. Jacques},
  journal= {arXiv preprint arXiv:0908.1536},
  year   = {2009}
}

Comments

Submitted to Physical Review Letters

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