Carbon p Electron Ferromagnetism in Silicon Carbide
Materials Science
2015-03-12 v1
Abstract
Ferromagnetism can occur in wide-band gap semiconductors as well as in carbon-based materials when specific defects are introduced. It is thus desirable to establish a direct relation between the defects and the resulting ferromagnetism. Here, we contribute to revealing the origin of defect-induced ferromagnetism using SiC as a prototypical example. We show that the long-range ferromagnetic coupling can be attributed to the p electrons of the nearest-neighbor carbon atoms around the VSiVC divacancies. Thus, the ferromagnetism is traced down to its microscopic, electronic origin.
Keywords
Cite
@article{arxiv.1503.00487,
title = {Carbon p Electron Ferromagnetism in Silicon Carbide},
author = {Y. Wang and Y. Liu and G. Wang and W. Anwand and C. Jenkins and E. Arenholz and F. Munnik and O. Gordan and G. Salvan and D. R. T. Zahn and X. Chen and S. Gemming and M. Helm and S. Zhou},
journal= {arXiv preprint arXiv:1503.00487},
year = {2015}
}
Comments
27 pages, 9 figures, Scientific Reports, in press (2015)