We explore experimentally bichromatic (frequencies ω1 and ω2) photoresistance of a two-dimensional electron system in the regimes of microwave-induced resistance oscillations and zero-resistance states. We find bichromatic resistance to be well described by a superposition of ω1 and ω2 components, provided that both monochromatic resistances are positive. This relation holds even when the oscillation amplitudes are small and one could expect additive contributions from monochromatic photoresistances. In contrast, whenever a zero-resistance state is formed by one of the frequencies, such superposition relation breaks down and the bichromatic resistance is strongly suppressed.
@article{arxiv.cond-mat/0605488,
title = {Bichromatic Microwave Photoresistance of Two-Dimensional Electron System},
author = {M. A. Zudov and R. R. Du and L. N. Pfeiffer and K. W. West},
journal= {arXiv preprint arXiv:cond-mat/0605488},
year = {2009}
}